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Features...
- Pentagon Concept More...
- Double Clean Concept More...
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Recent versatile semiconductor manufacturing lines and
advanced technical nodes require higher cleaning technology than ever. Dainippon
Screen flexibly supports these demands with the lineup of its wide range of
cleaning tools. Dainippon Screen's cleaners include:
- SS-3000 spin scrubber, which physically removes minute
particles;
- MP-3000 spin processor, which incorporates multiple
chemical cleaning chambers;
- SR-3000 polymer remover, which thoroughly removes residual
resist polymer after dry ashing;
- MP-3000CB, which achieves bevel cleaning in copper
interconnect processes;
- VP-C812 vapor phase cleaner, which enables highly selective
etching of silicon oxides.
By standardizing the platform of these cleaners,
Dainippon Screen has developed the SU-3000 AQUASPIN double cleaning system,
which supports next generation cleaning/drying processes and the mini fab
concept.
Enabling the optimal cleaning matched to the surface and
backside condition of each wafer, the SU-3000 realizes ultra clean processing,
which has not been possible with conventional single wafer cleaners and batch
cleaners.
1.
Pentagon Concept
The synergy of the advanced five units
- Several processing units (max. 4 units) can be
incorporated in a single platform.
- A combination of process units (1+3, 2+2 and
others) is selectable, in order to achieve the required process tact.
- An optional wafer reversing unit enables
chemical and physical cleaning for both sides of wafers.
- A flexible unit combination supports the new
processes created by the new materials and the CD shrinkage.
2.
Double Clean Concept
An ultra-clean surface processing that uses two units
- Conventional simultaneous, double-sided
cleaning by batch cleaners has often resulted in cross contamination, however,
our single wafer, double-cleaning method cleans both sides of wafers without
any transfer of contaminants.
- More advanced cleaning results are available
by combining the MP unit, which features a reputable FEOL processes, and the
SS unit, which boasts the No.1 worldwide market share as a physical cleaner.
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