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The SK-2000 is a state of the art coat/develop system designed for processing the most advanced integrated circuits as we all need for next generation devices. Maintaining strict environmental control and thermal history, makes this tool ideal for advanced Deep-UV processing.
Enhanced coat and develop technologies provide performance capable of meeting future design rule reductions. The SK-2000 employs a compact vertical machine architecture, designed to conserve valuable clean room space.
Its upgraded transfer efficiency, optimized system configuration, and chemical reduction offer you high productivity at a low operating cost (i.e.; low C.O.O). The user friendly interface and touch screen operation is ideal in high volume manufacturing environments.
1. Increased Functions/Decreased Size
The SK-2000 incorporates many new technologies for advanced processing and C.O.O. reduction, while reducing the footprint of the tool. Its footprint is 2/3 of conventional machines (reduction varies depending on exact system configuration). Critical components such as pumps and resist/ARC can be installed in the main body of the machine. The system also provides enhanced flexibility with regard to system configuration.
2. Resist Reduction
This system features the new VPS coating system providing highly uniform coatings using 1/3 (or less) of the resist compared to conventional coaters. A new nozzle design allows more chemical dispenses per coat module. The SK-2000 also supports coatings of thin resist films and others.
3. New Develop Technology
Slit-Scan develop technology ensures optimal puddle development, resulting in state-of-the-art CD uniformity and resist profiles. In addition to CD performance, the Slit-Scan system does not generate defects normally associated with develop dispense.
4. Optimized for Chemically Amplified Resists
The SK-2000 enclosure provides strict environmental control thanks to system designs optimized by sophisticated simulation techniques and air flow tests. High precision hot plates and TACT transfer software allows you to produce wafers with extremely uniform PEB and consistent thermal histories. As a result, high productivity, stability, and reliability using chemically amplified resists is realized.
5. High Speed Wafer Transfer System
The new SK-2000 transfer system is capable of system throughputs up to 120 wafers per hour.
6. User Friendly Maintenance
Touch screen maintenance panels are conveniently located above each spin module. A portable maintenance panel is also provided allowing manual operation of the system from a variety of locations. Both, provide maximum convenience for maintenance personnel.
7. CD-ROM Documentation
CD-ROM documentation is allowing convenient reference in paper-less clean rooms. The documentation includes instruction manuals, parts list, etc.
8. Other Functions
The SK-2000 is designed in compliance with global standards. The user friendly GUI interface is ideal for manufacturing and engineering. ACU units are integrated above spin modules providing accurate point-of-use control without inflating external footprint.
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